變轉速之旋轉塗佈實驗研究

以作者查詢圖書館館藏

、以作者查詢臺灣博碩士

、以作者查詢全國書目

、勘誤回報

、線上人數：13

、訪客IP：3.144.238.20

姓名

蔡居恕(Jui-Shu Tsai ) 查詢紙本館藏

畢業系所

機械工程研究所

論文名稱

變轉速之旋轉塗佈實驗研究

相關論文

★ 化學機械研磨流場模擬實驗研究	★ 微小熱點之主動式冷卻
★ 大尺寸晶圓厚膜塗佈	★ 科氏力與預塗薄膜對旋轉塗佈之影響
★ 微液滴對微熱點之冷卻	★ 大尺寸晶圓之化學機械研磨實驗研究
★ 液晶顯示器旋轉塗佈研究	★ 流體黏度對旋塗減量之影響
★ 微熱點與微溫度感測器製作	★ 高溫蓄熱器理論模擬
★ 熱氣泡式噴墨塗佈	★ 注液模式對旋轉塗佈之影響
★ 磁流體旋塗不穩定之研究	★ TFT-LCD狹縫式塗佈研究
★ 彩色濾光片噴塗研究	★ 科氏力對不穩定手指狀之影響及光阻減量研究

檔案

[Endnote RIS 格式]

[Bibtex 格式]

[相關文章]

[文章引用]

[完整記錄]

[館藏目錄]

至系統瀏覽論文 ( 永不開放)

摘要(中)

科技日新月異，隨著半導體工業的發展，使用大尺寸晶圓已成為現今趨勢，傳統應用於8吋以下晶圓的旋塗模式應用在大尺寸晶圓的塗佈上，需要增加流體原料的注液量或提高旋塗時的轉速，以增加最大的塗佈面積，而前者會造成流體原料的大量浪費，後者在提高轉速的同時會產生風剪效應 (wind shear effect)，致使旋塗表面液膜的均勻性受到破壞，因此，建立一新式的旋轉塗佈模式為本研究的重點。同時，以實驗的方式觀察風剪效應及科氏力對液膜塗佈的影響。
根據研究結果發現，風剪效應的存在確實會影響液膜表面的平坦，而科氏力的作用會使得不穩定手指狀流變寬，幫助液膜塗佈。藉由提高注液時的轉速，加大離心力以增加液膜塗佈面積，隨即驟降轉速進行後段旋佈，以避免風剪效應影響薄膜均勻性為前提，依此旋塗模式可應用於大尺寸晶圓覆膜製程上。此外，配合注液速率的增加及注液量的改變，必能得到一最佳的旋塗模式，提供半導體業作為製程改進之參考。

關鍵字(中)

★ 不穩定手指狀流
★ 旋轉塗佈
★ 注液速率
★ 科氏力
★ 變轉速
★ 風剪效應

關鍵字(英)

論文目次

目錄
摘要I
目錄II
表目錄IV
圖目錄V
符號說明表VII
第一章緒論1
1-1前言1
1-2文獻回顧2
1-2.1旋轉塗佈之文獻回顧2
1-2.2直接注液之文獻回顧4
1-2.3不穩定手指狀流之文獻回顧4
1-2.4 風剪效應之文獻回顧8
第二章實驗設備與方法11
2-1真空吸引式變轉速控制系統簡介11
2-2影像擷取分析系統簡介12
2-3可變流率注液系統簡介13
2-4實驗方法14
2-4.1 旋轉塗佈之變轉速製程16
2-4.2 注液速率實驗研究17
第三章結果與討論18
3-1 旋轉塗佈之變轉速製程18
3-1.1風剪效應可視化實驗19
3-1.2降轉速實驗參數決定20
3-1.3降轉速對矽油液膜擴展的影響21
3-1.4降轉速對光阻液膜擴展的影響22
3-2 注液速率實驗研究25
3-2.1注液速率對液膜擴展的影響25
3-2.2黏度對液膜擴展的影響26
3-2.3揮發性對液膜擴展的影響27
3-2.4科氏力對不穩定手指狀流的影響27
3-2.5無因次分析29
第四章結論31
參考文獻33
附表36
附圖41

參考文獻

1. A. G. Emsilie, F. T. Bonner, and L. G. Peck, Flow of a Viscous Liquid on a Rotating Disk, J. Appl. Phys., Vol. 29, pp. 858-863,(1958)
2. A. Acrivos, M. Shan, and E. E. Petersen, On the Flow of a Non-Newtonian Liquid on a Rotating Disk, J. Appl. Phys., Vol 31, pp. 963-968,(1960)
3. D. E. Bornside, C. W. Maccsko, and L. E., Scriven, Spin Coating: One-Dimensional Model, J. Appl. Phys., Vol. 66, pp. 5185-5193,(1989)
4. D. Meyerhofer, Characteristics of Resist Films Produced by Spinning, J. Appl. Phys., Vol. 49, pp. 3993-3997,(1978)
5. W. W. Flack, D. D. Soong, A. T. Bell, and D. W. Hess, A Mathematical Model for Spin Coating of Polymer Resist, J. Appl. Phys., Vol. 56, pp. 1199-1206,(1984)
6. T. Yada,, T. Maejima, M. Aoki, and M. Umesaki, Thin-Film Formation by Spin Coating: Characteristics of a Positive Photoresist, Jpn. J. Appl. Phys. Vol. 34, pp. 6279-6284,(1995)
7. T. Yada, T. Maejima, and M. Aoki, Formation of a Positive Photoresist Thin Film by Spin Coating: Influence of Atmospheric Humidity, Jpn. J. Appl. Phys. Vol. 36, pp. 7041-7047,(1997)
8. T. Yada, M. Aoki, T. Maejima, and A. Ishizu, Formation of a Positive Photoresist Thin Film by Spin Coating: Influence of Atmospheric Temperature, Jpn. J. Appl. Phys. Vol. 36, pp. 372-377.(1997)
9. T. Yada, Formation of a Negative Photoresist Thin Film by Spin Coating, Jpn. J. Appl. Phys. Vol. 37, pp. 2752-2757.(1998)
10. B. G. Higgins, Film Flow on a Rotating Disk, Phys. Fluids, Vol. 29, pp. 3522-3529,(1986)
11. C. T. Wang and S. C. Yen, Theoretical Analysis of Film Uniformity in Spinning Processes, Chem. Eng. Sci., Vol. 50, pp. 989-999,(1995)
12. J. H. Hwang and F. Ma, On the Flow of a Thin Liquid Film over a Rough Rotating Disk, J. Appl. Phys. Vol. 66, pp. 388-394(1989).
13. J. H. Hwang and F. Ma, On the Depletion of a Thin Liquid Film over a Rough Rotating Disk, Mechanics Research Communications, Vol. 17, pp. 423-428,(1990).
14. R. K. Youkoski and D. S. Soane, Model for Spin Coating in Microelectronic Applications, J. Appl. Phys., Vol. 72, pp. 725-740.(1992)
15. J. Gu, M. D. Bullwinkel, and G. A. Campbell, J. Electrochem. Soc., Vol. 142, pp.907-913(1995)
16. A. F. Charwat, R. E. Kelly, and C. Gazley, The Flow and Stability of Thin Liquid Films on A Rotating Disk, J. Fluid Mech., Vol. 53, pp. 227-255.(1972)
17. D. J. Needham and J. H. Merkin, The Development of Nonlinear Waves on the Surface of a Horizontally Rotating Thin Liquid Film, J. Fluid Mech., Vol. 184, pp. 357-379.(1987)
18. F. Melo, J. F. Joanny, and S. Fauve, Fingering Instability of Spinning Drops, Phys. Review Letters, Vol. 63, pp. 1958-1961.(1989)
19. N. Fraysse and G. M. Homsy, An Experimental Study of Rivulet Instabilities in Centrifugal Spin Coating of Viscous Newtonian and Non-Newtonian Fluids, Phys. Fluids, Vol. 6, pp. 1491-1504.(1994)
20. M. A. Spaid and G. M. Homsy, Stability of Viscoelastics Dynamic Contact Lines: An Experimental Study, Phys. Fluids, Vol. 9, pp. 823- 834. (1997)
21. Y. D. Shikhmurzaev, Spreading of Drop on Solid Surface in a Quasi-Static Regime, Phys. Fluids, Vol. 9, pp.266-275, (1997)
22. E. Momoniat and D. P. Mason, Investigation of the Coriolis Force on a Thin Fluid Film on a Rotating Disk, Int. J. Non-Linear Mech., Vol. 33, pp. 1069-1088, (1998)
23. S. K. Wilson, R. Hunt, and B. R. Duffy, The Rate of Spreading in Spin Coating, J. Fluid Mech., Vol. 413, pp. 65-88, (2000)
24. F. C. Chou, S. C. Gong, M. W. Wang, and K. T. Lie, On the Reduction Liquid Dispensed in Spin Coating, ASME FED- 239, Proc. 1996, ASME Fluids Engineering Division Summer Meeting, pp. 553-558, San Diego, CA., (1996)
25. F. C. Chou, M. W. Wang, S. C. Gong, and Z. G. Yang, Reduction of Photoresist Usage during Spin Coating, Journal of Electronic Materials, Vol. 30, pp. 432-438, (2001)
26. 周復初,卓浩江和王明文,轉速對旋轉塗佈液膜穩定的影響,中國機械工程學會第十六屆全國學術研討會,第五冊 pp. H049-H054，中華民國八十八年十二月
27. F. C. Chou, H. J. Juo, M. W. Wang, and S. J. Dai, Effect of Injection Rate on Fingering Instabilities during Spin Coating, Procs. of 8th International Symposium on Transport Phenomena and Dynamics of Rotating Machinery (ISROMAC-8), Vol. 2, pp. 500-505.(2000)
28. F. C. Chou and M. W. Wang, Photoresist Spin Coating on 300 mm Wafer, Procs. 15th National Conf. on Mech. Engng, CSME, pp. 209-216, Tainan, ROC.
29. F. C. Chou, P. Y. Wu, and S. C. Gong, Analytical Solutions of Film Planarization during Spin Coating, Jpn. J. Appl. Phys., Vol. 37, pp. 4321-4327. (1998)
30. P. Y. Wu and F. C. Chou, Complete Analytical Solutions of Film Planarization during Spin Coating, J. Electrochem. Soc., Vol. 146, pp. 3819-3826.(1999)
31. M. W. Wang, H. K. Yu, and F. C. Chou, Effect of a Prewetting Thin Film on Fingering Instabilities During Spin Coating, accepted for presentation at Third Pacific Symposium on Flow Visualization & Image Processing to be held in Moui, Hawaii on March. (2001)
32. S. Middleman, The Effect of Induced Air-Flow on the Spin Coating of Viscous Liquids, J. Appl. Phys. ,Vol. 62, pp. 2530-2532.(1987)
33. F. Ma, and J. H. Hwang, The Effect of Air Shear on the Flow of a Thin Liquid Film over a Rough Rotating Disk, J. Appl. Phys., Vol. 68, pp. 1265-1271.(1991)
34. T. J. Rehg, and B. G. Higgins, The Effect of Inertia and Interfacial Shear on Film Flow on A Rotating Disk, Phys. Fluids, Vol. 31, pp. 1360-1371.(1988)
35. W. H. McConnell, On the Rate of Thinning of Thin Liquid Films on a Rotating Disk, J. Appl. Phys., Vol. 64, pp.2232-2233.(1988)
36. M. Yanagisawa, Slip Effect for Thin Liquid Film on a Rotating Disk, J. Appl. Phys., Vol. 61, pp.1034-1037.(1987)
37. S. C. Gong, and F. C. Chou, Effect of Wind shear on the Film Thickness Distribution over Rotating Doughnut Disks, Jpn. J. Appl. Phys., Vol. 36, pp380-384.(1997)
38. F. C. Chou and P. Y. Wu, Effect of Air Shear on Film Planarization during Spin Coating, J. Electrochem. Soc., Vol. 147, pp. 699-705.(2000)

指導教授

周復初(Fu-Chu Chou)

審核日期

2001-7-6

推文